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1

Evaluation of critical design parameters of an ion projector for 1 Gbit DRAM production

W.H. Bru¨nger, H. Lo¨schner, G. Stengl, W. Fallmann, W. Finkelstein, J. Melngailis

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 660 KB

english, 1995

2

Temperature dependence of the microwave behavior of polar semiconductors: n-InSb at 134 GHz

Journal:

Journal of Applied Physics

Year:

1973

Language:

english

File:

PDF, 694 KB

english, 1973

3

Ion projection lithography for vacuum microelectronics

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1993

Language:

english

File:

PDF, 877 KB

english, 1993

4

Projection ion beam lithography

Year:

1993

Language:

english

File:

PDF, 734 KB

english, 1993

5

Avalanche injection and local breakdown in n-type InSb

Journal:

Journal of Applied Physics

Year:

1973

Language:

english

File:

PDF, 955 KB

english, 1973

6

Anisotropic hot-electron microwave conductivity of n-InSb at 84 K and 134 GHz

Journal:

Journal of Applied Physics

Year:

1972

Language:

english

File:

PDF, 389 KB

english, 1972

7

Drilling of glass by excimer laser mask projection technique

Keiper, Bernd, Exner, Horst, Löschner, Udo, Kuntze, Thomas

Journal:

Journal of Laser Applications

Year:

2000

Language:

english

File:

PDF, 509 KB

english, 2000

8

Generation of wavelength-dependent, periodic line pattern in metal nanoparticle-containing polymer films by femtosecond laser irradiation

Kiesow, A., Strohkark, S., Löschner, K., Heilmann, A., Podlipensky, A., Abdolvand, A., Seifert, G.

Journal:

Applied Physics Letters

Year:

2005

Language:

english

File:

PDF, 530 KB

english, 2005

9

Fabrication of submicron deep ultraviolet masks by ion microprojection

Stangl, G., Rüdenauer, F. G., Stengl, G., Löschner, H., Maurer, W., Wolf, P.

Journal:

Applied Physics Letters

Year:

1985

Language:

english

File:

PDF, 481 KB

english, 1985

10

Ion projection lithography: International development program

R. Kaesmaier, H. Löschner, G. Stengl, J. C. Wolfe, P. Ruchhoeft

Year:

1999

Language:

english

File:

PDF, 740 KB

english, 1999

11

Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks

J. L. Torres, H. N. Nounu, J. R. Wasson, J. C. Wolfe, J. Lutz, E. Haugeneder, H. Löschner, G. Stengl, R. Kaesmaier

Year:

2000

Language:

english

File:

PDF, 567 KB

english, 2000

12

Experimental results of the stochastic Coulomb interaction in ion projection lithography

P. W. H. De Jager, G. Derksen, B. Mertens, E. Cekan, G. Lammer, H. Vonach, H. Buschbeck, M. Zeininger, C. Horner, H. Löschner, G. Stengl, A. J. Bleeker, J. Benschop, F. Shi, B. Volland, P. Hudek, H.

Year:

1999

Language:

english

File:

PDF, 687 KB

english, 1999

13

NANOJET: Nanostructuring via a downstream plasmajet

J. Voigt, B. Reinker, I. W. Rangelow, G. Mariotto, I. Shvets, P. Guethner, H. Löschner

Year:

1999

Language:

english

File:

PDF, 756 KB

english, 1999

14

Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices

W. H. Bruenger, M. Torkler, M. Weiss, H. Löschner, K. Leung, Y. Lee, P. Hudek, I. W. Rangelow, G. Stangl, W. Fallmann

Year:

1999

Language:

english

File:

PDF, 863 KB

english, 1999

15

Comparison of silicon stencil mask distortion measurements with finite element analysis

A. Ehrmann, T. Struck, A. Chalupka, E. Haugeneder, H. Löschner, J. Butschke, M. Irmscher, F. Letzkus, R. Springer, A. Degen, I. W. Rangelow, F. Shi, E. Sossna, B. Volland, R. Engelstad, E. Lovell, R.

Year:

1999

Language:

english

File:

PDF, 763 KB

english, 1999

16

High precision stress measurement of ion projection lithography mask membranes

J. L. Torres, J. C. Wolfe, P. Ruchhoeft, T. F. Kennedy, J. Podolski, K. Kragler, A. Ehrmann, R. Kaesmaier, H. Löschner

Year:

2002

Language:

english

File:

PDF, 823 KB

english, 2002

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